老虎證券
Invest
Pricing
Rewards
Support
About
Quotes
TigerAI
登入
立即註冊
Toggle
美股
詳情
本頁面由Tiger Trade Technology Pte. Ltd.提供服務
Corgi Lithography & Semiconductor Photonics ETF
22.43
+0.4500
2.05%
盤後:
22.66
0.2300
+1.03%
19:54 EDT
成交量:
31.35萬
成交額:
703.35萬
市值:
3.99億
市盈率:
- -
高:
22.73
開:
22.37
低:
22.07
收:
21.98
52周最高:
32.00
52周最低:
20.61
股本:
1,780.00萬
流通股本:
1,780.00萬
量比:
0.65
換手率:
1.76%
股息:
- -
股息率:
- -
淨資產收益率:
--
總資產收益率:
--
市淨率:
--
市盈率(LYR):
- -
資料載入中...
總覽
公司
新聞資訊
公告
SK海力士目標2028年將High NA EUV技術用於DRAM內存量產
IT之家
·
09/11
三星與ASML合作開發下一代EUV光刻掩模版
格隆汇
·
09/09
據首爾經濟日報,三星電子將與全球最大的光刻設備製造商ASML共同開發高數值孔徑(High-NA)極紫外(EUV)光刻技術
智通财经
·
09/09
英特爾晶圓代工與阿斯麥深化合作,推動High-NA EUV用於更大尺寸AI芯片
TradingKey中文
·
09/08
瑞銀:中國未來十年內難開發可媲美阿斯麥頂尖 EUV 光刻設備,DUV 量產或需兩至五年
链捕手
·
09/02
三星電子計劃在1nm級製程節點實現High NA EUV商業應用
格隆汇
·
08/12
三星計劃 2030 年 1 納米工藝導入 High-NA EUV 技術
链捕手
·
08/11
SK海力士據報推進EUV工藝 引入新材料PSM
格隆汇
·
08/11
SK海力士正致力於推進其極紫外光刻(EUV)技術,以實現下一代DRAM的量產。公司於去年首次推出高數值孔徑(High-N
智通财经
·
08/11
消息稱三星暫緩High-NA EUV技術量產,因財務考量而非技術瓶頸
IT之家
·
07/17
24小時環球政經要聞 | 7月16日
格隆汇
·
07/16
這家初創公司一天內推出了35只ETF——而且沒有放緩的打算
路透中文
·
06/22
韓國簡化極紫外光刻機進口審批流程
环球市场播报
·
06/02
韓國簡化極紫外光刻機進口程序,以支持芯片產業發展
环球市场播报
·
06/02
英特格(ENTG)與JSR Corporation聯合宣佈就EUV光刻技術達成非獨家交叉許可協議
金吾财讯
·
05/27
{"basename":"/hant","ssrTDKData":{"titleTemplate":"%s - 老虎證券","title":"Easy breezy. No more feesies.","description":"Tiger Trade is a mobile trading app offering real time data, low commission fees and a free demo account. Download now to start investing in ETFs, options and the global share market.","keywords":"老虎國際,美股交易,港股交易,交易美股,股票信息,股價,美股行情,美股打新,港股打新,IPO打新,購買美股,全球投資","social":{"ogDescription":"Tiger Trade is a mobile trading app offering real time data, low commission fees and a free demo account. Download now to start investing in ETFs, options and the global share market.","ogImage":"https://c1.itigergrowtha.com/portal5/static/media/og-logo.0a0bd8dc.png","ogUrl":"https://www.thetigerbrokers.com/hant/stock/EUV/news"},"companyName":"老虎證券"},"pageData":{"isMobile":false,"isTiger":false,"isTTM":true,"region":"NZL","license":"TBKIWI","edition":"fundamental","symbol":"EUV","isAnalysisPage":false},"__swrFallback__":{"@#url:\"https://hq.skytigris.cn/stock_info/detail/global\",params:#delay:false,,method:\"POST\",data:#items:@#symbol:\"EUV\",,,,,undefined,":{"symbol":"EUV","market":"US","secType":"STK","nameCN":"Corgi Lithography & Semiconductor Photonics ETF","latestPrice":22.43,"timestamp":1789588800000,"preClose":21.98,"halted":0,"volume":313475,"hourTrading":{"tag":"盘后","latestPrice":22.66,"preClose":22.43,"latestTime":"19:54 EDT","volume":2925,"amount":65891.7025,"timestamp":1789602893787,"change":0.23,"changeRate":0.010254,"amplitude":0.011592},"delay":0,"changeRate":0.02047315741583254,"floatShares":17800000,"shares":17800000,"eps":0,"marketStatus":"未開盤","change":0.45,"latestTime":"09-16 16:00:00 EDT","open":22.37,"high":22.7299,"low":22.065,"amount":7033460.51825,"amplitude":0.03025,"askPrice":0,"askSize":0,"bidPrice":0,"bidSize":0,"shortable":3,"etf":1,"ttmEps":0,"tradingStatus":0,"nextMarketStatus":{"tag":"盤前交易","tradingStatus":1,"beginTime":1789632000000},"marketStatusCode":0,"adr":0,"exchange":"CBOE","adjPreClose":21.98,"nav":21.99,"aum":390872250,"bidAskSpread":0,"preHourTrading":{"tag":"盘前","latestPrice":22.32,"preClose":21.98,"latestTime":"09:08 EDT","volume":4373,"amount":97760.898864,"timestamp":1789564133291,"change":0.34,"changeRate":0.015469,"amplitude":0.008189},"postHourTrading":{"tag":"盘后","latestPrice":22.66,"preClose":22.43,"latestTime":"19:54 EDT","volume":2925,"amount":65891.7025,"timestamp":1789602893787,"change":0.23,"changeRate":0.010254,"amplitude":0.011592},"volumeRatio":0.647749,"impliedVol":0.4558,"impliedVolPercentile":0.0482},"@#url:\"https://hq.skytigris.cn/stock_info/fundamental/all\",params:#delay:false,,method:\"POST\",data:#items:@#symbol:\"EUV\",,,,,undefined,":{"symbol":"EUV","floatShares":17800000,"roa":"--","roe":"--","lyrEps":0,"volumeRatio":0.647749,"shares":17800000,"dividePrice":0,"high":22.7299,"amplitude":0.03025,"preClose":21.98,"low":22.065,"week52Low":20.61,"pbRate":"--","week52High":31.995,"institutionHeld":0,"latestPrice":22.43,"eps":0,"divideRate":0,"volume":313475,"delay":0,"ttmEps":0,"open":22.37,"prevYearClose":26.35,"prevWeekClose":23.95,"prevMonthClose":23.37,"prevQuarterClose":31.98,"fiveDayClose":24.3,"twentyDayClose":25.62,"sixtyDayClose":31.08},"@#url:\"https://hq.skytigris.cn/fundamental/corporate_actions/details/EUV\",params:#limit:5,,,undefined,":[],"@#url:\"https://hq.skytigris.cn/fundamental/dividend/history\",params:#symbol:\"EUV\",market:\"US\",,,undefined,":[],"@#url:\"https://hq.skytigris.cn/fundamental/estimate/recommendation\",params:#symbol:\"EUV\",market:\"US\",delay:false,,,undefined,":{},"$inf$@#url:\"https://stock-news.skytigris.cn/v2/news/list\",params:#symbols:\"EUV\",pageSize:20,pageCount:1,lang_content:\"cn\",edition:\"fundamental\",,,undefined,":[{"items":[{"id":"2666511097","title":"SK海力士目標2028年將High NA EUV技術用於DRAM內存量產","url":"https://stock-news.laohu8.com/highlight/detail?id=2666511097","media":"IT之家","labels":["productRelease"],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2666511097?lang=zh_tw&edition=fundamental","pubTime":"2026-09-11 07:21","pubTimestamp":1789082463,"startTime":"0","endTime":"0","summary":"IT之家 9 月 11 日消息,参考路透社此前报道,SK 海力士在一份声明中表示,该企业目标在 2028 年将 High NAEUV 光刻图案化工艺应用于 DRAM 的大规模生产。SK 海力士正评估是否加入这一联盟。IT之家注意到,三星电子在同时新闻稿中确认计划在 2028 年将 High NA EUV 技术用于先进 DRAM 内存的大规模生产;美光则曾表示,计划为第 7 代 10nm 级 DRAM 工艺 1δ 导入最新一代的 EUV 光刻设备。","market":"hk","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://tech.ifeng.com/c/8wKBgkGQL4M","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"productRelease","news_rank":0,"length":0,"strategy_id":0,"source":"fenghuang_stock","symbols":["DISK","DRAM","SKHU","MULL","MIC","LU0823413587.USD","LU0823397285.USD","SKHL","EDZ","LU0823413660.USD","MUD","SKHN","LU1956131251.USD","SKHQ","SKUU","HYNX","RAMZ","DRMP","SKHZ","SKHY","MUG","07709","DRMY","EEMO","SK","EUV","SKDD","SKHA","MUZ","MUYY","BK4141","DRAL","BK4588","SKHYV","MUU","SKHX","LU0823397103.USD","RAM"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2666384305","title":"三星與ASML合作開發下一代EUV光刻掩模版","url":"https://stock-news.laohu8.com/highlight/detail?id=2666384305","media":"格隆汇","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2666384305?lang=zh_tw&edition=fundamental","pubTime":"2026-09-09 08:37","pubTimestamp":1788914256,"startTime":"0","endTime":"0","summary":null,"market":"us","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.gelonghui.com/rss/live/live.xml","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":"live_gelonghui","symbols":["BK4585","EMXC","BK4588","BGIA","EUV"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2666308290","title":"據首爾經濟日報,三星電子將與全球最大的光刻設備製造商ASML共同開發高數值孔徑(High-NA)極紫外(EUV)光刻技術","url":"https://stock-news.laohu8.com/highlight/detail?id=2666308290","media":"智通财经","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2666308290?lang=zh_tw&edition=fundamental","pubTime":"2026-09-09 07:18","pubTimestamp":1788909537,"startTime":"0","endTime":"0","summary":null,"market":"hk","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.zhitongcaijing.com/immediately.html?type=usstock","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":"live_zhitongcaijing","symbols":["BK4170","BGIA","EUV","BK4543","SSNLF","07747","07347"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2665546328","title":"英特爾晶圓代工與阿斯麥深化合作,推動High-NA EUV用於更大尺寸AI芯片","url":"https://stock-news.laohu8.com/highlight/detail?id=2665546328","media":"TradingKey中文","labels":["corporation"],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2665546328?lang=zh_tw&edition=fundamental","pubTime":"2026-09-08 15:03","pubTimestamp":1788851034,"startTime":"0","endTime":"0","summary":"TradingKey - 英特尔(INTC)晶圆代工业务正与阿斯麦(ASML)进一步深化High-NA EUV合作。阿斯麦最新表示,将与包括英特尔、英伟达(NVDA)、台积电(TSM)和三星电子在内的主要芯片企业合作,开发更大尺寸光掩模,以推动下一代High-NA EUV设备用于大型AI和数据中心芯片制造。","market":"sg","thumbnail":"https://resource.tradingkey.com/cms_uploads/img/20240102/c0531811fe341e7a5268ef210c462723.jpg","type":0,"news_type":0,"thumbnails":["https://resource.tradingkey.com/cms_uploads/img/20240102/c0531811fe341e7a5268ef210c462723.jpg"],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.tradingkey.com/zh-hans/analysis/stocks/us-stock/262155438-intel-foundry-asml-deepen-collaboration-promote-high-na-euv-larger-ai-chips-tradingkey","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"corporation","news_rank":0,"length":0,"strategy_id":0,"source":null,"symbols":["AMDL","BGIA","CNAV","TSMU","03191","SEMY","AMUU","AMDG","XSEM","TSMY","TWSC","QQQA","AIS","SOXM","SMHC","SHOC","TSMX","TSMZ","INTC","AVGC","LRNZ","SINTCmain","CHPX","AIVC","TMYY","GPTZ","TSMG","ARMH","AIBU","AMDC","WISE","LINT","UMCX","INTW","EUV","TSEU","LEGR","TSXU","AVGX","AIQ","TSEG","FTXL","TTEQ","INT","XNTK","FAI","ALAI","AIFD","GFSG","EPAI"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2664860323","title":"瑞銀:中國未來十年內難開發可媲美阿斯麥頂尖 EUV 光刻設備,DUV 量產或需兩至五年","url":"https://stock-news.laohu8.com/highlight/detail?id=2664860323","media":"链捕手","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2664860323?lang=zh_tw&edition=fundamental","pubTime":"2026-09-02 09:16","pubTimestamp":1788311804,"startTime":"0","endTime":"0","summary":" ChainCatcher 消息,据彭博社报道,瑞银集团分析师预计,未来十年内中国半导体制造能力可能难以取得足够快的进展,从而开发出能够真正替代阿斯麦尖端 EUV 光刻技术的方案。瑞银分析师在报告中写道,“他们目前所处的阶段似乎与阿斯麦在 2004 年时相当”,从专利申请活动来看,尤其是在光源和激光子系统领域,中国当前技术成熟度大致相当于阿斯麦开始大规模生产 EUV 设备前 15 年的水平。\n\n瑞银同时预计,中国有望在未来两到五年内具备浸没式 DUV 光刻机的大规模量产能力。浸没式 DUV 虽不如 EUV 先进,但仍是芯片制造不可或缺的设备。阿斯麦浸没式 DUV 售价近 9000 万美元,EUV 设备每台超 2 亿美元。中国是阿斯麦最大市场之一,但受出口限制,阿斯麦被禁止向中国出售 EUV 设备。瑞银指出,考虑到良率和产能差距及监管限制,中国光刻设备不太可能在境外得到应用。阿斯麦发言人对置评请求未作回应。该报道基于瑞银分析师的预测观点,实际进展以产业动态为准。 ","market":"sh","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.chaincatcher.com/article/2286995","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"-1","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":null,"symbols":["BGIA","EUV"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2658944014","title":"三星電子計劃在1nm級製程節點實現High NA EUV商業應用","url":"https://stock-news.laohu8.com/highlight/detail?id=2658944014","media":"格隆汇","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2658944014?lang=zh_tw&edition=fundamental","pubTime":"2026-08-12 08:43","pubTimestamp":1786495389,"startTime":"0","endTime":"0","summary":null,"market":"hk","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.gelonghui.com/rss/live/live.xml","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":"live_gelonghui","symbols":["NA","BK4170","BK4141","BK4543","SSNLF","07747","EUV"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2658967542","title":"三星計劃 2030 年 1 納米工藝導入 High-NA EUV 技術","url":"https://stock-news.laohu8.com/highlight/detail?id=2658967542","media":"链捕手","labels":["productRelease"],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2658967542?lang=zh_tw&edition=fundamental","pubTime":"2026-08-11 14:30","pubTimestamp":1786429812,"startTime":"0","endTime":"0","summary":" ChainCatcher 消息,三星电子半导体研究所 Foundry 工艺开发团队朴昌民在“2026 下一代光刻+图案化学术大会”上表示,公司计划从 1 纳米(A10)工艺开始应用 High-NA EUV 技术,目标在 2030 年左右实现量产。三星目前在 2 纳米及以下工艺中仍采用现有 0.33 NA EUV 的多重图案化方案,计划 2029 年量产 1.4 纳米,后续再推进至 1 纳米。\n\nHigh-NA EUV 将透镜数值孔径(NA)从 0.33 提升至 0.55,分辨率更高,可将原先需多重图案化的超微细工艺简化为单次图案化,有利于降低制造成本、提升生产效率和设计灵活性。但该技术难度高、设备昂贵,且需要配套材料技术同步升级。朴昌民预计 1.4 纳米和 1 纳米工艺仍以 0.33 NA EUV 多重图案化为主流,此后 High-NA 图案化将成为新一代工艺的核心技术。 ","market":"hk","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.chaincatcher.com/article/2282019","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"1","news_top_title":null,"news_tag":"productRelease","news_rank":0,"length":0,"strategy_id":0,"source":null,"symbols":["BK4141","EMXC","NA","EUV","BK4588","BK4585"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2658611319","title":"SK海力士據報推進EUV工藝 引入新材料PSM","url":"https://stock-news.laohu8.com/highlight/detail?id=2658611319","media":"格隆汇","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2658611319?lang=zh_tw&edition=fundamental","pubTime":"2026-08-11 12:59","pubTimestamp":1786424380,"startTime":"0","endTime":"0","summary":null,"market":"us","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.gelonghui.com/rss/live/live.xml","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":"live_gelonghui","symbols":["SKHY","DRAL","EDZ","SKHZ","RAM","SKDD","EEMO","SK","SKHX","EUV","PSM","BK4141","HYNX","SKUU","SKHYV","SKHA","07709","SKHU","RAMZ"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2658961274","title":"SK海力士正致力於推進其極紫外光刻(EUV)技術,以實現下一代DRAM的量產。公司於去年首次推出高數值孔徑(High-N","url":"https://stock-news.laohu8.com/highlight/detail?id=2658961274","media":"智通财经","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2658961274?lang=zh_tw&edition=fundamental","pubTime":"2026-08-11 12:56","pubTimestamp":1786424160,"startTime":"0","endTime":"0","summary":null,"market":"us","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.zhitongcaijing.com/immediately.html?type=usstock","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":"live_zhitongcaijing","symbols":["DRMP","DRAL","EDZ","SKHY","RAM","SKHZ","DRMY","BK4588","MUZ","SKDD","EEMO","SK","MIC","MUD","SKHX","DISK","EUV","MUU","DRAM","BK4141","HYNX","MUYY","SKUU","SKHYV","SKHA","MULL","07709","SKHU","RAMZ"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2652459409","title":"消息稱三星暫緩High-NA EUV技術量產,因財務考量而非技術瓶頸","url":"https://stock-news.laohu8.com/highlight/detail?id=2652459409","media":"IT之家","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2652459409?lang=zh_tw&edition=fundamental","pubTime":"2026-07-17 16:02","pubTimestamp":1784275374,"startTime":"0","endTime":"0","summary":"IT之家 7 月 17 日消息,据 TrendForce 今天报道,英特尔已率先将 High-NA EUV 技术应用于量产 。然而三星这边虽然已经安装了两台 High-NA EUV 设备,却迟迟没有跟进量产。业内人士认为,三星这么做更多是出于财务考量,而非技术瓶颈。据报道,三星去年已在华城园区安装首台 High-NA EUV 设备,并于今年上半年再增设一台,总投资金额预计超 1 万亿韩元 。对于三星来说,目前将 High-NA EUV 设备投入量产,意味着固定运营成本大幅增加。","market":"us","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://tech.ifeng.com/c/8uprDf1mMVs","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":"fenghuang_stock","symbols":["NA","EUV","EMXC","BK4588","BK4141","BK4585"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2651548492","title":"24小時環球政經要聞 | 7月16日","url":"https://stock-news.laohu8.com/highlight/detail?id=2651548492","media":"格隆汇","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2651548492?lang=zh_tw&edition=fundamental","pubTime":"2026-07-16 08:51","pubTimestamp":1784163097,"startTime":"0","endTime":"0","summary":"全球热点狙击","market":"us","thumbnail":"https://img3.gelonghui.com/e9fa7-59d53fbd-5064-4226-90af-60bd1804183b.jpg?guru_height=716&guru_width=1280&guru_size=138145","type":0,"news_type":0,"thumbnails":["https://img3.gelonghui.com/e9fa7-59d53fbd-5064-4226-90af-60bd1804183b.jpg?guru_height=716&guru_width=1280&guru_size=138145"],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.gelonghui.com/p/5592805","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":"gelonghui_highlight","symbols":["LU1280957306.USD","IYF","LU1571399168.USD","LU1914381329.SGD","LU0251142724.SGD","LU2168564222.USD","CHAT","LU0640476718.USD","BRKC","LU2168564065.EUR","XLF","BRKU","LU0980610538.SGD","IXG","BK4176","BK4520","UUP","BRKW","IPO","IYG","LU0157215616.USD","LU1201861249.SGD","BK4533","EDZ","EUV","HK0000914660.USD","LU1074936037.SGD","BK4534","DFNL","LU0648001328.SGD","LU0787776722.HKD","LU0149725797.USD","FNCL","BRK.B","IE00BWXC8680.SGD","BRKD","LU0256863811.USD","IE00BK4W5L77.USD","BK4550","LU0048573561.USD","IE00BK4W5M84.HKD","VFH","IE000M9KFDE8.USD","LU0170899867.USD","LU0210528500.USD","UDN","IE00B1XK9C88.USD","UYG","MIC","LU2244417387.USD"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2645802554","title":"這家初創公司一天內推出了35只ETF——而且沒有放緩的打算","url":"https://stock-news.laohu8.com/highlight/detail?id=2645802554","media":"路透中文","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2645802554?lang=zh_tw&edition=fundamental","pubTime":"2026-06-22 18:02","pubTimestamp":1782122531,"startTime":"0","endTime":"0","summary":"Corgi随后于6月2日又推出了35只基金。","market":"us","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://api.refinitiv.com/data/news/v1/stories/urn:newsml:reuters.com:20260622:nL4S42U0OI:1","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":null,"symbols":["EUV"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2640074994","title":"韓國簡化極紫外光刻機進口審批流程","url":"https://stock-news.laohu8.com/highlight/detail?id=2640074994","media":"环球市场播报","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2640074994?lang=zh_tw&edition=fundamental","pubTime":"2026-06-02 13:18","pubTimestamp":1780377480,"startTime":"0","endTime":"0","summary":"韩国产业通商资源部在一份声明中表示,为助力本土蓬勃发展的芯片产业维系竞争力,韩国将简化半导体生产所用极紫外(EUV)光刻机的进口通关手续。根据内阁批准的修订版《高压气体安全控制法》实施细则,EUV 设备进口办理周期将从此前的34天缩短至约9天。韩国产业部表示,此项新政将利好三星电子与 SK 海力士,两家企业可更快完成高端芯片生产设备的装机投产。\n\n\n海量资讯、精准解读,尽在新浪财经APP\n\n责任编辑:王永生","market":"sg","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://finance.sina.com.cn/stock/usstock/c/2026-06-02/doc-inhzyxft1701102.shtml","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":"sina","symbols":["EUV"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2640299429","title":"韓國簡化極紫外光刻機進口程序,以支持芯片產業發展","url":"https://stock-news.laohu8.com/highlight/detail?id=2640299429","media":"环球市场播报","labels":["policyRegulatory"],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2640299429?lang=zh_tw&edition=fundamental","pubTime":"2026-06-02 13:01","pubTimestamp":1780376519,"startTime":"0","endTime":"0","summary":"韩国产业通商资源部周二表示,政府将简化极紫外光刻(EUV)设备的进口程序。EUV是半导体制造的关键设备,此举旨在帮助韩国蓬勃发展的芯片产业保持其制造竞争力。\n 根据韩国内阁批准的《高压气体安全管理法》修订实施细则,EUV设备的进口时间预计从目前的34天缩短至约9天。\n 韩国产业通商资源部表示,此次修订将有助于三星电子和SK海力士等国内芯片制造商快速获得EUV设备,这对于建立先进的生产设施至关重要。\n\n\n海量资讯、精准解读,尽在新浪财经APP\n\n责任编辑:于健 SF069","market":"us","thumbnail":"","type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://finance.sina.com.cn/stock/usstock/c/2026-06-02/doc-inhzyxft1694268.shtml","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"1","news_top_title":null,"news_tag":"policyRegulatory","news_rank":0,"length":0,"strategy_id":0,"source":"sina_us","symbols":["EUV"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2638056175","title":"英特格(ENTG)與JSR Corporation聯合宣佈就EUV光刻技術達成非獨家交叉許可協議","url":"https://stock-news.laohu8.com/highlight/detail?id=2638056175","media":"金吾财讯","labels":["corporation"],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2638056175?lang=zh_tw&edition=fundamental","pubTime":"2026-05-27 17:20","pubTimestamp":1779873651,"startTime":"0","endTime":"0","summary":"JSR株式会社高管木村彻同样指出,将Inpria的光刻胶创新与Entegris的纯化及材料处理能力相结合,将大幅拓宽这些尖端技术在半导体材料生态系统中的应用适用性。","market":"sh","thumbnail":"https://static.szfiu.com/news/20250107/OTc4NDY1YzgwYTY5ZDI5OGQwMTAxMzU2NDM1Mjg5Ng==.png","type":0,"news_type":0,"thumbnails":["https://static.szfiu.com/news/20250107/OTc4NDY1YzgwYTY5ZDI5OGQwMTAxMzU2NDM1Mjg5Ng==.png"],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"300850","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"1","news_top_title":null,"news_tag":"corporation","news_rank":0,"length":0,"strategy_id":0,"source":null,"symbols":["BK4585","IE00BN0W2V16.EUR","LU0154245673.USD","EUV","IE00BN0W2T93.GBP","IE00BN0W2W23.USD","LU0154245756.USD","LU1892829315.USD","ENTG","BK4147"],"isVideo":false,"video":null,"gpt_icon":0}],"pageSize":20,"totalPage":1,"pageCount":1,"totalSize":15,"code":"91000000","status":"200"}]}}